Parametric Shadow Mask Positives

Parametric Shadow Mask Positives

Description

A Fully Customize-Able Shadow Mask Created For The Class My4777 At Michigan Technological University. For Use With A Negative Photo-Resist (Pr) During Uv-Lithography. It Is Used In Micro-Fabrication Of Solar Cells And Its Customize-Able To Get Different Feature Shapes And Sizes. Open It In Customizer To Edit The Dimensions Of The Shadow Mask To Your Liking

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Engineering